Canon shipped its brand-new lithography system for chip manufacturing to a Texas-based semiconductor consortium. The vendor aims to take market share from leader ASML by simplifying the most expensive step in chipmaking.
The system enables patterns with a minimum line width of 14nm, equivalent to the 5nm node process required to produce the most advanced logic semiconductors currently available, Canon said in a statement. The first nanoimprint lithography (NIL) machine was scheduled to be sent to the Texas Institute for Electronics, which will use it for the R&D of advanced semiconductors and production of prototypes.
Canon explained traditional photolithography equipment transfers a circuit pattern by projecting it onto the resin applied to the wafer to burn a circuit, while the NIL approach involves stamping a mold of the design into it. The Japan-based company unveiled the machine in 2023, promoting a simplified process and lower cost of chipmaking by stamping designs rather than burning using ultraviolet light.
Rimac Technology unveiled its latest portfolio of advanced battery and powertrain technologies at IAA Mobility 2025 in Munich, including next-generation solid-state solutions and evolutions of its current batteries and e-Axles.
The new JUPITER supercomputer, inaugurated at Forschungszentrum Jülich in Germany, has officially become the first European system to achieve the exascale threshold.
Qualcomm unveiled its Snapdragon 7s Gen 4 mobile chipset for mid-range devices.
